Pulsed laser deposition of amorphous thin films
Provider: Grantová agentura ČR
Programme: Standardní projekty (řešení od 1.1.2011)
Implementation period: 01.01.11 - 31.12.13
Workplace:
Fakulta chemicko-technologická - Katedra polygrafie a fotofyziky
Investigator: Němec PetrTeam member: Pavlišta Martin | Veselý David | Wágner Tomáš | Kalendová Andréa
Description:
An advanced deposition technique, pulsed laser deposition (PLD), will be employed for the fabrication of amorphous thin films based on selected chalcogenides and oxides. The goal of the project is to optimize PLD process in order to prepare high-quality applicable thin films structures and also to characterize in detail their physico-chemical properties. The results of the project will contribute to deepen the fundamental knowledge about the PLD process, and photo- and thermally-induced phenomena in amorphous solids. It is anticipated that obtained results will demonstrate the pertinence of PLD technique for the fabrication of novel thin films with tailored parameters required for their applicability as hightech materials in optics, optoelectronics, electronics etc.
An advanced deposition technique, pulsed laser deposition (PLD), will be employed for the fabrication of amorphous thin films based on selected chalcogenides and oxides. The goal of the project is to optimize PLD process in order to prepare high-quality applicable thin films structures and also to characterize in detail their physico-chemical properties. The results of the project will contribute to deepen the fundamental knowledge about the PLD process, and photo- and thermally-induced phenomena in amorphous solids. It is anticipated that obtained results will demonstrate the pertinence of PLD technique for the fabrication of novel thin films with tailored parameters required for their applicability as hightech materials in optics, optoelectronics, electronics etc.
