Advanced methods of fabrication of chalcogenide thin films and their modifications
Provider: Grantová agentura ČR
Programme: Standardní projekty
Implementation period: 01.01.18 - 31.12.20
Workplace:
Fakulta chemicko-technologická - Katedra polygrafie a fotofyziky
Investigator: Němec Petr
Description:
Advanced methods of physical deposition of thin films (radio-frequency magnetron sputtering, pulsed laser deposition, etc.) will be studied in the frame of the project. The attention will be paid also to the fabrication of thin films from solution via spin coating method. Deposition conditions will be optimized with the aim of fabrication of high quality thin chalcogenide films. Starting synthesized deposition materials and prepared thin films will be characterized in detail by structural and optical methods. Thin chalcogenide films will be modified by the influence of temperature or light, and also by dopants. The results of the project will lead to chalcogenide materials with innovative properties, composition, and optimized conditions of deposition of their thin films.
Advanced methods of physical deposition of thin films (radio-frequency magnetron sputtering, pulsed laser deposition, etc.) will be studied in the frame of the project. The attention will be paid also to the fabrication of thin films from solution via spin coating method. Deposition conditions will be optimized with the aim of fabrication of high quality thin chalcogenide films. Starting synthesized deposition materials and prepared thin films will be characterized in detail by structural and optical methods. Thin chalcogenide films will be modified by the influence of temperature or light, and also by dopants. The results of the project will lead to chalcogenide materials with innovative properties, composition, and optimized conditions of deposition of their thin films.
