Publication detail

Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

Authors: Čech | Studýnka | Čechalová | Mistrík Jan | Zemek

Year: 2008

Type of publication: článek v odborném periodiku

Name of source: Surface and Coatings Technology

Publisher name: Elsevier Science SA

Place: Lausanne

Page from-to: 5572-5575

Titles:

Language	Name	Abstract	Keywords
cze	Korelace mechanických, optických a chemických vlastností tenkých vrstev deponovaných PECVD	Prace je zaměřena na určení korelace mechanických, optických a chemických vlastností tenkých vrstev viniltrietoxysilanu deponovaných PECVD.	elipsometrie;PECVD;FTIR;plasmová polymerace;fotoelektronová spektroskopie
eng	Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD	Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm?10.5 μm) wereanalyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9?34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.	ellipsometry;Fourier transform infrared spectroscopy;photoelectron spectroscopy;PECVD;plasma polymerization

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