Publication detail
Chalcogenide glass e-beam and photo-resists for ultrathin gray scale patterning
Authors:
Kovalskiy A. | Vlček Miroslav | Cech J. | Heffner W.R. | Waits C.M. | Dubey M. | Jain H.
Year: 2009
Type of publication: článek v odborném periodiku
Name of source: Journal of Micro/Nanolithography, MEMS, and MOEMS
Publisher name: SPIE - The International Society for Optical Engineering
Page from-to: 0430121-04301211
