Publication detail

Fabrication of nano-gratings in arsenic sulphide films

Authors: Neilson | Kovalskiy Andriy | Vlček Miroslav | Jain | Miller

Year: 2007

Type of publication: článek v odborném periodiku

Name of source: Journal of Non-Crystalline Solids

Publisher name: Elsevier Science BV

Place: Amsterdam

Page from-to: 1427-1430

Titles:

Language	Name	Abstract	Keywords
cze	Tvorba nanomřížek ve vrstvách sulfidů arzenu	Chalkogenidová skla se expozicí vysokoenergetickým svazkem elektronů stávají chemicky odolnější vůči aminovým lázním. Této schopnosti těchto materiálů bylo využito pro tvorbu nanomřížek za pomoci elektronového litografu. Ve vrstvách systému As-S se podařilo připravit linie o tloušťce 27 nm, navzájem oddělené 7 nm širokými mezerami, které měly výšku 80 - 250 nm.
eng	Fabrication of nano-gratings in arsenic sulphide films	Chalcogenide glasses, generally soluble in alkaline solvents, become more resistant to etching in amine-based solvents after exposure to high energy electrons (30 keV). We have used this characteristic for fabricating structures that are suitable for nanolithography. Using a scanning electron microscope equipped with a lithography system, nano-gratings are written digitally with varying point spacing, line pitch, and electron dose. The spot size of the electron beam is about 1 nm, but the ﬁnest structures that have been created in our arsenic sulphide ﬁlms have lines with widths of 27 nm, separation of 7 nm, and heights from 80 to 250 nm. As the line pitch decreases, the best resolved spacing between the lines decreases until the lines blend into each other, much before the e-beam overlap. A discussion of the optimization of fabrication parameters is included.	nano, grating, chalcogenide

Search