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Nano-scale annealing-induced structural changes in As-rich pulsed laser deposited AsxSe100-x films studied by XPS.
Authors: Siokou A. | Kalyva M. | Yannopoulos S.N. | Němec Petr | Frumar Miloslav
Year: 2006
Type of publication: článek v odborném periodiku
Name of source: Journal of Non-Crystalline Solids
Publisher name: Elsevier Science BV
Place: Amsterdam
Page from-to: 1520-1524
Titles:
Language Name Abstract Keywords
cze "Nano-scale" strukturní změny vyvolané temperací v arsenem bohatých AsxSe100-x vrstvách deponovaných pulzním laserem studované XPS. "Nano-scale" strukturní změny vyvolané temperací v arsenem bohatých AsxSe100-x vrstvách deponovaných pulzním laserem byly studovány technikou XPS. amorfní chalkogenidy; tenké vrstvy; pulzní laserová depozice; XPS
eng Nano-scale annealing-induced structural changes in As-rich pulsed laser deposited AsxSe100-x films studied by XPS. Nano-scale annealing-induced structural changes in As-rich pulsed laser deposited AsxSe100-x films were studied by x-ray photoelectron spectroscopy. amorphous chalcogenides; thin films; pulsed laser deposition; XPS