Publication detail

Sub-micrometer soft lithography of a bulk chalcogenide glass

Authors: Kohoutek Tomáš | Orava Jiří | Greer A. Lindsay | Fudouzi Hiroshi

Year: 2013

Type of publication: článek v odborném periodiku

Name of source: Optics Express

Publisher name: Optical Society of America

Place: Washington, DC

Page from-to: 9584-9591

Titles:

Language	Name	Abstract	Keywords
cze	Sub-mikronova soft litografie chalkogenidových skel	periodické submikrometroveé difrakční mřížky s periodou 625 nm, amplitudou 625 nm a povrchovou hrubostí 3 nm byly uspesne natisteny do povrchu chalkogenidového skla se složenímAsS2 pomocí metody soft-lithography.	nanoimprint litografie, příprava optických prvků
eng	Sub-micrometer soft lithography of a bulk chalcogenide glass	We demonstrate, for the first time, time-and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area. A periodic array of submicrometer lines (diffraction grating) with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe2 bulk glass at temperature 225 degrees C, i.e. 5 degrees C below the softening point of the glass. Sub-micrometer soft lithography into chalcogenide bulk glasses shows good reliability, reproducibility and promise for feasible fabrication of various dispersive optical elements, antireflection surfaces, 2D photonic structures and nano-structured surfaces for enhanced photonic properties and chemical sensing. (C) 2013 Optical Society of America	nanoimprint lithography; imprint lithography; wave-guides; fibers; nanostructures; fabrication; micro

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