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Pulsed laser deposited alumina thin films
Year: 2015
Type of publication: ostatní - přednáška nebo poster
Page from-to: nestránkováno
Titles:
Language Name Abstract Keywords
eng Pulsed laser deposited alumina thin films Thin alumina films with thickness from a few nanometers up to 100-200 nm were fabricated via UV PLD exploiting KrF excimer laser operating at 248 nm (300 mJ, 30 ns) under vacuum or under different pressure in Ar atmosphere. Prepared layers were characterized in terms of their morphology and topography (using SEM/AFM), structure (XRD) and optical properties (variable angle spectroscopic ellipsometry). alumina; pulsed laser deposition; thin films