University of PardubiceFaculty of Chemical Technology

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Electron beam induced changes in optical properties of glassy As35S65 chalcogenide thin films studied by imaging ellipsometry

Authors: Janíček Petr | Funke Sebastian | Thiesen P.H. | Šlang Stanislav | Pálka Karel | Mistrík Jan | Grinco Marina | Vlček Miroslav

Year: 2017

Type of publication: ostatní - přednáška nebo poster

Page from-to: nestránkováno

Titles:

Language	Name	Abstract	Keywords
eng	Electron beam induced changes in optical properties of glassy As35S65 chalcogenide thin films studied by imaging ellipsometry	Based on and extended of previous results we present detailed study of the change of the optical properties (refractive index and extinction coefficient) and morphological properties (e.g. thickness and surface roughness) of thin film of As35S65 chalcogenide glass for different doses of electron beam exposure. By electron beam exposure at different doses local changes of optical properties on micro- and also nano-scale were induced. This study is focused on usage of spectroscopic imaging ellipsometry as a tool for determination of optical and morphological properties of micro-structured thin film of As35S65 chalcogenide glass. Knowledge of the optical properties change dependence on different electron beam dose can help for fabricating of optical elements by high resolution electron beam lithography.