University of PardubiceFaculty of Chemical Technology

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Photo and electron beam sensitivity of spin-coated chalcogenide glasses thin films

Authors: Vlček Miroslav | Šlang Stanislav | Pálka Karel | Loghina Liudmila | Kadeřávková Anastasia

Year: 2019

Type of publication: ostatní - přednáška nebo poster

Page from-to: nestránkováno

Titles:

Language	Name	Abstract	Keywords
eng	Photo and electron beam sensitivity of spin-coated chalcogenide glasses thin films	Chalcogenide glasses (ChGs) are promising materials for photonic applications due to their unique properties and functionalities [1]. Their thin films (TFs) are usually deposited by vacuum deposition techniques, but cheaper solution based deposition techniques such as spin-coating (SC) or dip-coating are currently gaining attention. We prepared and characterized As and Ge based sulfide ChG thin films deposited from their solutions by SC technique. The changes of their physical and chemical properties induced by photo- and electron beam exposure were compared to properties and behavior of TFs deposited by thermal vacuum evaporation (TVE) technique. Exposure induced changes of chemical resistance were exploited for surface structuring of prepared TFs by contact UV lithography and e- beam lithography. Examples of high optical quality diffractive optical elements fabricated in studied ChGs are presented. These techniques also confirmed, that SC ChGs TFs can be successfully used as high resolution inorganic resists, which are in some cases more suitable and have higher quality that the resists of same composition prepared by TVE. That opens the variety of other potential application possibilities and research directions for solution-deposited ChG TFs. J.-L. Adam, X. Zhang, Chalcogenide Glasses: Preparation, Properties and Applications, Woodhead Publishing, 2013