Publication detail

Fabrication of thin-metal microparticles using lift-off photolithography

Authors: Novotný Jakub | Kupčík Rudolf | Jusková Petra | Bílková Zuzana | Foret František

Year: 2014

Type of publication: ostatní - přednáška nebo poster

Page from-to: nestránkováno

Titles:

Language	Name	Abstract	Keywords
eng	Fabrication of thin-metal microparticles using lift-off photolithography	This poster presents simple method of preparation of thin-metal particles utilizing lift-off photolithography and metal sputtering. Standard double layer lift-off photolithography was employed, with lift-off resist with high dissolution rate serving as sacrificial layer, which was then covered by positive tone photoresist. Several approaches for exposure were considered, of those the most efficient and precise was the use of Heidelberg μPG-101 laser writer. Classical exposure through photomask was also experimented with, using plotter film mask and mercury-vapor lamp. Lift-off approach reduces the need to work with hazardous chemicals in comparison to chemical etching. This is also reflected in wider possibilities in combinations of metals, which are not influenced by the choice and availability of etchants. Chemisorption on the metal surface, e.g. gold, provides a basis for various applications ranging from oligonucleotide arrays to immunoassays. In combination with ferromagnetic properties these particles could be used for separation and movement control using magnetic field. The thin-metal microparticles show potential for wide variety of uses in bioanalytical methods based on molecular recognition.	Photolithography, metal sputtering

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