Apparatus for evaluation of periodic and one-shot electrooptical effects 1)
Microscopes with digitizing video systems and image analysis 1)
Thermal conductivity aparatus LFA 457 - Netzsch 1)
Arc-melting and sythesis (3000 °) 1)
RF melting and synthesis (1800 °C) 1)
Single crystal growth using Brigman method (up to 1000 °C) 1)
Horizontal synthesis resistance furnace (up to 1000 °C) 1)
Seebeck coefficien measurement facilities, 100 - 500K and 300 - 1200K 1)
Hot pressing facility (2200K, 10 t) compactation and sythesis at elevated temperatures and presures 1)
Thin films vacuum thermal evaporation deposition system 1)
Spectroscopic ellipsometer VASE (Woollam, Ltd.) for spectral range 190 to 2 300 nm 2)
Spectroscopic ellipsometer IR -VASE (Woollam, Ltd.) for spectral range 1 700-33 000 nm 2)
Contact person:
1) prof. Ing. Drašar Č., Dr.: Cestmir.Drasar@upce.cz
2) Mgr. Mistrík J., Ph.D.: Jan.Mistrik@upce.cz
