Publikace detail

Selective etching of thin chalcogenide layers and its applications

Autoři: Fišerová Alena | Vlček Miroslav

Rok: 2006

Druh publikace: ostatní - přednáška nebo poster

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Jazyk	Název	Abstrakt	Klíčová slova
cze	Selektivní leptání tenkých vrstev chalkogenidů a aplikace jevu	Photoinduced changes of chemical resistence of amorphous chalcogenide thin layers of As-S, As-S-Ge, Ge-S, Ge-Se and Ge-S-Se systems are studied in this work. Possible mechanisms of both, positive and negative selective etching in alkaline solvents are discussed in this paper. Application of this phenomenon for diffractive optical elements fabrication is demonstrated. High efficiency phase gratings and microlense arrays were prepared in the layers of some studied compositions.
eng	Selective etching of thin chalcogenide layers and its applications	Photoinduced changes of chemical resistence of amorphous chalcogenide thin layers of As-S, As-S-Ge, Ge-S, Ge-Se and Ge-S-Se systems are studied in this work. Possible mechanisms of both, positive and negative selective etching in alkaline solvents are discussed in this paper. Application of this phenomenon for diffractive optical elements fabrication is demonstrated. High efficiency phase gratings and microlense arrays were prepared in the layers of some studied compositions.	chalcogenide glass, selective etching,

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