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On the mechanism of gray scale patterning of Ag-containing As2S3 thin films

Rok: 2007

Druh publikace: článek v odborném periodiku

Název zdroje: Journal of Physics and Chemistry of Solids

Název nakladatele: Pergamon-Elsevier Science Ltd.

Místo vydání: Oxford

Strana od-do: 920-925

Tituly:

Jazyk	Název	Abstrakt	Klíčová slova
cze	Mechanismus tvorby 3D struktur v tenkých vrstvách Ag-As2S3	We demonstrate an application of photo-induced silver diffusion into chalcogenide glass thin film for gray scale lithography. The gray scale chalcogenide glass mask generated in the present experiments was dry etched using reactive ion etching. The etching rate increases almost linearly with the total dose of absorbed light, thus forming the basis of gray scale lithography. Chemical composition as well as electronic structure on the surface of chalcogenide glassy film has been determined by high-resolution X-ray photoelectron spectroscopy (XPS) of the film at different stages of the patterning process. Influence of thermal annealing of chalcogenide film before Ag deposition has been investigated using scanning electron microscopy (SEM) and XPS techniques. It is observed that thermal annealing of the chalcogenide film slows the process of silver diffusion during the proposed processing procedure. A mechanism is proposed to explain the stages of gray-scale lithography based on chalcogenide glass photoresists
eng	On the mechanism of gray scale patterning of Ag-containing As2S3 thin films	We demonstrate an application of photo-induced silver diffusion into chalcogenide glass thin film for gray scale lithography. The gray scale chalcogenide glass mask generated in the present experiments was dry etched using reactive ion etching. The etching rate increases almost linearly with the total dose of absorbed light, thus forming the basis of gray scale lithography. Chemical composition as well as electronic structure on the surface of chalcogenide glassy film has been determined by high-resolution X-ray photoelectron spectroscopy (XPS) of the film at different stages of the patterning process. Influence of thermal annealing of chalcogenide film before Ag deposition has been investigated using scanning electron microscopy (SEM) and XPS techniques. It is observed that thermal annealing of the chalcogenide film slows the process of silver diffusion during the proposed processing procedure. A mechanism is proposed to explain the stages of gray-scale lithography based on chalcogenide glass photoresists	Amorphous materials; Thin films; Photoelectron spectroscopy; Diffusion; Microstructure

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