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Crystallization behavior of RF magnetron sputtered Ge2Sb2.3Te4Se thin films
Autoři: Gutwirth Jan | Přikryl Jan | Bezdička Petr | Střižík Lukáš | Vlček Milan | Wágner Tomáš | Frumar Miloslav
Rok: 2012
Druh publikace: ostatní do riv
Strana od-do: nestránkováno
Tituly:
Jazyk Název Abstrakt Klíčová slova
cze Crystallization behavior of RF magnetron sputtered Ge2Sb2.3Te4Se thin films Thin amorphous Ge-Sb-Te-Se films were deposited by RF (f = 13.56 MHz) magnetron sputtering of Ge2Sb2.3Te4Se target in argon plasma. Feasibility of prepared thin films for PC-RAM application was tested via four-point probe measurement of temperature dependence of sheet resistance known as Van der Pauw technique. As-deposited and thermally treated thin films were characterized by the same way. Composition, chemical homogeneity and surface morphology were studied by Energy Dispersive X-Ray analysis coupled with Scanning Electron Microscopy (SEM-EDX) whilst crystallinity was determined by X-Ray diffraction (XRD). Moreover, optical properties of as-deposited thin films were determined due Variable Angle Spectroscopic Ellipsometry (VASE). Influence of deposition conditions or thermal treatment to composition, crystallinity and surface morphology were established. Profile of temperature dependence of sheet resistance and characteristic temperatures (e.g. crystallization temperature) were obtained and discussed. Krystalizace; chalkogenidy; tenké vrstvy
eng Crystallization behavior of RF magnetron sputtered Ge2Sb2.3Te4Se thin films Thin amorphous Ge-Sb-Te-Se films were deposited by RF (f = 13.56 MHz) magnetron sputtering of Ge2Sb2.3Te4Se target in argon plasma. Feasibility of prepared thin films for PC-RAM application was tested via four-point probe measurement of temperature dependence of sheet resistance known as Van der Pauw technique. As-deposited and thermally treated thin films were characterized by the same way. Composition, chemical homogeneity and surface morphology were studied by Energy Dispersive X-Ray analysis coupled with Scanning Electron Microscopy (SEM-EDX) whilst crystallinity was determined by X-Ray diffraction (XRD). Moreover, optical properties of as-deposited thin films were determined due Variable Angle Spectroscopic Ellipsometry (VASE). Influence of deposition conditions or thermal treatment to composition, crystallinity and surface morphology were established. Profile of temperature dependence of sheet resistance and characteristic temperatures (e.g. crystallization temperature) were obtained and discussed. chalcogenides; thin films; magnetron sputtering; crystallization