Univerzita Pardubice Fakulta chemicko- technologická

Univerzita Pardubice

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Publikace detail

Hot Embossing of Chalcogenide Glass Thin Films

Autoři: Bůžek Jan | Schroeter S. | Pálka Karel | Vlček Miroslav

Rok: 2016

Druh publikace: ostatní - přednáška nebo poster

Strana od-do: nestránkováno

Tituly:

Jazyk	Název	Abstrakt	Klíčová slova
eng	Hot Embossing of Chalcogenide Glass Thin Films	Chalcogenide glasses are amorphous materials formed by group 16 elements excluding oxygen, together with more electropositive elements such as As, Ge, Sb and many others. Chalcogenide glasses exhibit a number of unique properties compared to common oxide glasses; for example wide IR transparency, significantly higher values of refractive index or lower structural rigidity. Lower structural rigidity allows for chalcogenide glasses to be used as solid electrolytes or changes to be induced in their structure under certain treatments such as exposure or annealing. These structural changes are the origin of optical properties and chemical resistance changes. Changes in chemical resistance after exposure to suitable radiation result in selective etching of the chalcogenide glass thin films. Thus chalcogenide glasses can be structured without the need of additional resists or can be used as resists in lithographic processes. Selective wet etching of the chalcogenide glass thin films is usually carried out in volatile solvents. To avoid the necessity to use liquid agents or expensive equipment for direct laser writing in the process of thin film structuring we employed hot embossing technique. In this work binary As-S and As-Se chalcogenide glass thin films with thickness d ~ 1000 nm were prepared by thermal vacuum evaporation at pressure ~10¬-4 Pa from synthesized bulk glasses. Plate-to-plate hot embossing was used to prepare optical gratings in the thin chalcogenide films. Linear gratings with depth in the range of approximately 10 - 2000 nm were prepared. Dependence of the grating profile on process parameters was investigated using AFM. The controlled process parameters included thin film composition, temperature, pressure and duration of embossing.	chalcogenide glass; embossing