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Publikace detail

Novel selenium ALD precursor
Rok: 2020
Druh publikace: ostatní - přednáška nebo poster
Strana od-do: nestránkováno
Tituly:
Jazyk Název Abstrakt Klíčová slova
eng Novel selenium ALD precursor Atomic layer deposition of metal chalcogenides steadily attracts more and more attention. These compounds possess interesting properties that may be utilized in semiconducting materials, photocatalysis, hydrogen evolution etc. Nevertheless, precursor portfolio for selenium deposition is very limited. Highly toxic H2Se or insufficiently reactive Et2Se (Et2Se2) were later replaced with bis(trialkylsilyl)selenides, which proved to be sufficiently volatile, thermally stable and versatile precursor for metal selenide thin layers fabrication. This work presents cyclic silylselenides bearing one or two atoms of selenium as new ALD precursors. They possess volatility and thermal stability similar to previous bis(trialkylsilyl)selenides, however rigid nature of these cycles render them higher air stability. The syntheses of precursors will be described along with their proper analyses (GC/MS, multinuclear NMR). Thermal behaviour was studied by TGA and DSC. All three target molecules were used as Se precursors in ALD by reacting them with MoCl5 to give corresponding MoSe2 thin layers on different substrates. ALD; silylselenides; volatility; thermal stability